Patent protection ensures the security and competitive advantage of intellectual property in the market by means of informed decisions, reliable patent application and accurate innovation control. The service supports inventors, development teams and companies who want to formally protect their inventions and evaluate international possibilities.

What is it and what it covers?

The service focuses on a comprehensive approach: from early innovation testing (prior art-analysis) to the registration of a professionally-formulated patent application and a useful model. By combining technical and strategic advice, targeted and cost-effective protection will be provided for both domestic and highly competitive field forces.

Who is appropriate?

• Industrial and technological developers who wish to protect deep innovation when entering the market.
• Product and scientific teams who need assistance in drawing up a patent application and strategic planning.
li>Li>Technological inventors who consider protecting as a useful model or patent.
• For companies that plan international expansion and need a clear overview of patent possibilities.

Why is this valuable?

Legal and professional patent protection increases market value, prevents copying and gives an advantage in partner negotiations and licensing agreements. The review of novelty reduces risks by avoiding costly and time-consuming errors at a later stage of the patent application.

Main services and advantages

• Update control - quick and comprehensive overview of existing technologies that explain the novelty and patentability of the invention.
• Patent application - technical strong and formalized documentation to support the development of the products.
• - alternative and often faster form of protection for smaller-cost specific products.
<International strategy - tips PCT, EP and national protection options to optimize l >l >l> l><Tehnical and strategic advice - practical Take the next step to strengthen protection and increase the value of intellectual capital.